27 December 1996 Advances in process matching for rules-based optical proximity correction
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Abstract
This paper reports advances to the Parametric Anchoring methodology in which a small number of representative line- space process measurements can be used to fit a process model to be used for Optical Proximity Correction (OPC). A correction rule table generation program uses the model to create the correction lookup tables to be used by a rules- based OPC correction program. The results of matching the process model to a variety of processes are shown.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oberdan W. Otto, Richard C. Henderson, "Advances in process matching for rules-based optical proximity correction", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262828; https://doi.org/10.1117/12.262828
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