27 December 1996 Benchmark study of mask writer lithography systems
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Abstract
SEMATECH has conducted a mask writer benchmark study in order to provide a description of the lithographic capability of the mask writer industry. Systems claimed by their manufacturers to have the ability to support 0.35 um or better lithography groundrules in a manufacturing environment were the focus of this study. The study describes the average performance and identifies any significant differences in capability among the various mask writer tools. The benchmarking was conducted as a blind study. Participant identity was protected by using the services of Arthur Anderson & Co. The parameters described in this paper include critical dimension (CD) control, registration, overlay (two plates), and throughput. Results of the study show that no participant consistently demonstrated the 50 nm CD uniformity performance required by the 1995 SIA roadmap for 0.35 um lithography. However, half the participants were able to demonstrate registration performance consistent with the Roadmap requirement of 70 nm 3 sigma. While throughput results varied greatly, one participant demonstrated superior capability.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lawrence Weins, Wayne Smith, "Benchmark study of mask writer lithography systems", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262813; https://doi.org/10.1117/12.262813
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