27 December 1996 Correction method for radial effect caused by spin process
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Owing to spin process used for mask manufacturing, the CD difference can be inevitably made in the radial direction by the centrifugal force. This difference can degrade CD uniformity of the given mask. So the ability of good maskmaking is closely related to the reduction of this difference as much as possible. In this paper, the CDCM (Critical Dimension Correction Method) is proposed. First, CD tendency of the given mask is mapped out. Then overall CD correction is done by making additional exposure for dose correction on the relatively underdeveloped CD region. The CDCM can also give some possibilities of improving wafer resolution by applying to the underdeveloped CD patterns on the wafer which are not corrected by layout design.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jin-Min Kim, Jin-Min Kim, Seong-Woon Choi, Seong-Woon Choi, Byung-Cheol Cha, Byung-Cheol Cha, Hee-Sun Yun, Hee-Sun Yun, Jung-Min Sohn, Jung-Min Sohn, } "Correction method for radial effect caused by spin process", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262833; https://doi.org/10.1117/12.262833

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