Through pellicle coordinate metrology

Hiroaki Okamoto; David E. Kettering

doi:10.1117/12.262803

27 December 1996 Through pellicle coordinate metrology

Hiroaki Okamoto, David E. Kettering

Proceedings Volume 2884, 16th Annual BACUS Symposium on Photomask Technology and Management; (1996) https://doi.org/10.1117/12.262803
Event: 16th Annual BACUS Symposium on Photomask Technology and Management, 1996, Redwood City, CA, United States

Abstract

Attaching a pellicle and frame to a photomask induces stresses which change the position of patterns on the mask by up to 100 nm depending upon factors including mounting procedure, mask thickness, and overall mask size. The Nikon XY-5i is used to measure the pattern placement before and after pelliclization to establish changes in the array due to the pelliclization process. The importance of this type of analysis as it relates to the overall mask error budget will be explored. The XY-5i system capability and technology to repeatably measure the pattern placement through the pellicle will be explained. Data gathered from several photomask sizes and thickness will be presented. In addition, automatic and manual pelliclization processes will be compared.

Citation Download Citation

Hiroaki Okamoto and David E. Kettering "Through pellicle coordinate metrology", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); https://doi.org/10.1117/12.262803

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