Translator Disclaimer
23 September 1996 Analysis of near-field holographic pattern formation using phase masks
Author Affiliations +
Abstract
The near-field holographic interference patterns of phase masks irradiated by excimer lasers is analyzed in details theoretically in this paper. The interference intensity patterns produced by periodic phase masks are calculated using scalar diffraction modeling with various assumptions of mask parameters.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Genxiang Chen, Shuisheng Jian, Ling Yang, Xun Li, Huang Ge, and Wei Wang "Analysis of near-field holographic pattern formation using phase masks", Proc. SPIE 2885, Holographic Optical Elements and Displays, (23 September 1996); https://doi.org/10.1117/12.251862
PROCEEDINGS
6 PAGES


SHARE
Advertisement
Advertisement
Back to Top