23 September 1996 Fabrication of fused silica phase masks by reactive ion etching
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A novel method for producing durable fused silica self- interference phase grating photomasks is described in this paper. The gratin pattern is formed into AZ-1350 photoresist by 325nm He-Cd laser optical holographic exposure and is transferred to a thin metal layer via focused ion beam lithography, then reactive ion etching in CHF3/O2 plasma is used to etch the fused silica substrate. Inspection performed by scanning electron microscopy shows that fabricated silica phase masks are perfect and no reactive deposition is formed int he grating grooves.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Genxiang Chen, Genxiang Chen, Shuisheng Jian, Shuisheng Jian, Ling Yang, Ling Yang, Xun Li, Xun Li, Meiqiao Cheng, Meiqiao Cheng, Yaqing Zhu, Yaqing Zhu, Li Li, Li Li, Huang Ge, Huang Ge, Wei Wang, Wei Wang, "Fabrication of fused silica phase masks by reactive ion etching", Proc. SPIE 2885, Holographic Optical Elements and Displays, (23 September 1996); doi: 10.1117/12.251861; https://doi.org/10.1117/12.251861

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