23 September 1996 Realization of optoelectronic interconnection of exposure and reconstruction at the same wavelength
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Proceedings Volume 2885, Holographic Optical Elements and Displays; (1996); doi: 10.1117/12.251856
Event: Photonics China '96, 1996, Beijing, China
Abstract
An optoelectronic interconnection based on volume holographic coupling elements located on a light-guiding glass plate has been realized by exposure at the wavelength of 630 nm. A light beam is reconstructed at the same wavelength and guided by total internal reflection inside the glass plate. The contraction coefficients and the refractive index change of the thin film of red sensitive photopolymer have been measured. Coupling gratings with an accurate period and a slanted angle have been designed.
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Guodong Liang, Mai Xu, Jiaqi Yu, "Realization of optoelectronic interconnection of exposure and reconstruction at the same wavelength", Proc. SPIE 2885, Holographic Optical Elements and Displays, (23 September 1996); doi: 10.1117/12.251856; http://dx.doi.org/10.1117/12.251856
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KEYWORDS
Thin films

Glasses

Holography

Refractive index

Optoelectronics

Optical interconnects

Reflection

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