Synchrotron radiation stimulated materials processing and reaction mechanisms

Tsuneo Urisu; Yoshiaki Imaizumi; Akitaka Yoshigoe

doi:10.1117/12.253111

30 September 1996 Synchrotron radiation stimulated materials processing and reaction mechanisms

Tsuneo Urisu, Yoshiaki Imaizumi, Akitaka Yoshigoe

Proceedings Volume 2888, Laser Processing of Materials and Industrial Applications; (1996) https://doi.org/10.1117/12.253111
Event: Photonics China '96, 1996, Beijing, China

Abstract

Synchrotron radiation (SR) stimulated surface process has been actively studied as anew application field of the SR in the last decade. The reaction mechanism study with these surface photochemical process is necessary to make clear the characteristics unique to the SR stimulated process and the develop an essentially new process technology. In situ observation of SR stimulated Si gas source molecular beam epitaxy by infrared reflection absorption spectroscopy and SR irradiation effects on the dimenthylalumium hydride condensed layer by x-ray photoelectron spectroscopy suggest the potential important of the site specific chemical reaction in the condensed system induced by the core electron excitations. A new process technique, selective core electron excitation process using a monochromatized SR beam, is proposed.

Citation Download Citation

Tsuneo Urisu, Yoshiaki Imaizumi, and Akitaka Yoshigoe "Synchrotron radiation stimulated materials processing and reaction mechanisms", Proc. SPIE 2888, Laser Processing of Materials and Industrial Applications, (30 September 1996); https://doi.org/10.1117/12.253111

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