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20 September 1996 Analysis of near-field interference after phase mask for fiber grating fabrication
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Abstract
Recently, for mass production supply the fabrication of fiber Bragg gratings with excimer lasers through a phase mask are popular everywhere. During this fabrication process the characteristics of near-field interference pattern play a significant role. In this work, by taking use of Rayleigh- Sommerfeld diffraction theory we calculated the intensity distribution of the interference pattern under different conditions. The analysis of result shows us that the distance of fiber with the phase mask and the divergent angle of the excimer laser dominants the main feature of interference pattern. A valuable suggestion was given out for producing higher quality FBGs.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Qingya Wang, Yushu Zhang, and Dingsan Gao "Analysis of near-field interference after phase mask for fiber grating fabrication", Proc. SPIE 2893, Fiber Optic Components and Optical Communication, (20 September 1996); https://doi.org/10.1117/12.252035
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