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3 October 1996 Scanning mirror uniformity optimum control
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Abstract
Scanning mirror uniformity directly effects the exposure area of exposure sample in the chamber of soft x-ray lithography beamline and station. The exposure uniformity control system consists of a scanning mirror, an in-situ Moire fringe grating system, a coupling glass fiber and a silicon photodiode, a high speed A/D interface and on-line microcomputer. Our main study is how to measure uniformity signal finest and how to transfer signal data into computer on-line fast enough. The required driving variation is programmed by a single piece computer which communicates with an IBM PC computer used to control main systems of lithography beamline. The system works so well in HESYRL. But the exposure uniformity is relative to stepping motor vibration frequency. it is not so easy to find a good frequency to get exposure uniformity as best as the system does. In this paper we will discuss on-line real control system in lithography beamline and its basic character. Some results analyzed and new ideas will have more potential prospects on industry application and other applications.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Congliang Guo "Scanning mirror uniformity optimum control", Proc. SPIE 2899, Automated Optical Inspection for Industry, (3 October 1996); https://doi.org/10.1117/12.253016
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