20 December 1996 Laser lithography technique to fabricate integrated optical elements by ion exchange in glass
Author Affiliations +
Proceedings Volume 2954, Fiber Integrated Optics; (1996) https://doi.org/10.1117/12.262433
Event: Advanced Imaging and Network Technologies, 1996, Berlin, Germany
Abstract
A simple, effective and low cost laser writing lithographic system is presented. This system with a simple optical design and interferometric control of the alignment is able to produce smallest optical features as 1 micrometers wide with high quality edges to produce prototypes of integrated optical elements by ion exchange in research laboratories. Results of several kinds of mask that can be generated for this systems as well as some of the integrated elements produced are shown.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vincente Moreno de las Cuevas, Vincente Moreno de las Cuevas, Jose Ramon Salgueiro, Jose Ramon Salgueiro, Carlos Montero, Carlos Montero, Xesus Prieto, Xesus Prieto, Jesus Linares, Jesus Linares, } "Laser lithography technique to fabricate integrated optical elements by ion exchange in glass", Proc. SPIE 2954, Fiber Integrated Optics, (20 December 1996); doi: 10.1117/12.262433; https://doi.org/10.1117/12.262433
PROCEEDINGS
6 PAGES


SHARE
Back to Top