13 May 1997 Computer-enhanced photon tunneling microscopy for surface characterization of optical materials
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Abstract
Surface characterization of optical materials is a time consuming and complex process. The complexity of these materials provides a challenging task for determining the effects of such factors as polishing, surface defects, subsurface fracture and variations in optical surface coatings. Our laboratory has incorporated several types of non-intrusive techniques for surface analysis and sample characterization. The newest and one of the most promising techniques is Computer Enhanced Photon Tunneling Microscopy. This paper describes our current photon tunneling microscopy (PTM) system and its use in the characterization of the surface topography of ion-implanted optical sapphire. Examination of implanted surfaces by PTM can be used to determine the amount of material removed by ion sputtering as well as the roughening of the surface by the implantation.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James D. Kleinmeyer, J. Derek Demaree, "Computer-enhanced photon tunneling microscopy for surface characterization of optical materials", Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); doi: 10.1117/12.274286; https://doi.org/10.1117/12.274286
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KEYWORDS
Microscopy

Photonic microstructures

Sapphire

Dielectrics

Microscopes

Chromium

Ions

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