Light scatter from high reflectors deposited by reactive dc magnetron sputtering

David W. Reicher; J. Sobczak; James Paul Black; Roger D. Petty; L. Arguello

doi:10.1117/12.274261

13 May 1997 Light scatter from high reflectors deposited by reactive dc magnetron sputtering

David W. Reicher, J. Sobczak, James Paul Black, Roger D. Petty, L. Arguello

Proceedings Volume 2966, Laser-Induced Damage in Optical Materials: 1996; (1997) https://doi.org/10.1117/12.274261
Event: Laser-Induced Damage in Optical Materials: 1996, 1996, Boulder, CO, United States

Abstract

Scatter from optical thin film coatings is a significant problem for high power laser optics. Theoretical aspects of the problem have ben well explored for scattering due to surface roughness. Over the past twenty years the surface roughness of optics has been significantly reduced. Improvements in optical surface fabrication and film deposition techniques have progressed to the point that even for complex coatings, surfaces of less than 1nm rms roughness are routinely achievable. As the surface roughness of optics decreases, bulk scatter, rather than topographic scatter, may be the major scatter source in these smooth surfaces. Atomic force microscopy can profile the surface of a coating with atomic resolution. By comparing the power spectral density (PSD) derived from the surface profile with the PSD derived from angle resolved scatter measurements, some conclusions can be reached on this question. Data from analysis of dual wavelength high reflectors deposited by reactive DC magnetron sputtered Nb₂O₃/SiO₂ and ZrO₂/SiO₂ structures will be presented, allowing analysis of results for these film materials.

Citation Download Citation

David W. Reicher, J. Sobczak, James Paul Black, Roger D. Petty, and L. Arguello "Light scatter from high reflectors deposited by reactive dc magnetron sputtering", Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); https://doi.org/10.1117/12.274261

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