13 May 1997 Optical properties of thin films deposited by reactive-Rf-magnetron sputtering
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Abstract
Optical coatings deposited by conventional evaporation processes have a number of shortcomings including weak adhesion which depends upon the subsurface condition of substrate, and the change of spectral characteristics and film stress in the relative humidity. Thin films coated by reactive-rf-magnetron sputtering improve these problems. In this paper, optical properties of thin films deposited by reactive-rf-magnetron sputtering are presented.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kunio Yoshida, Kunio Yoshida, Tomosumi Kamimura, Tomosumi Kamimura, Kanyoshi Ochi, Kanyoshi Ochi, Schukichi Kaku, Schukichi Kaku, Hidetsugu Yoshida, Hidetsugu Yoshida, Hisanori Fujita, Hisanori Fujita, F. Tani, F. Tani, M. Sunagawa, M. Sunagawa, Takayuki Okamoto, Takayuki Okamoto, } "Optical properties of thin films deposited by reactive-Rf-magnetron sputtering", Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); doi: 10.1117/12.274285; https://doi.org/10.1117/12.274285
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