13 May 1997 Optical properties of thin films deposited by reactive-Rf-magnetron sputtering
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Abstract
Optical coatings deposited by conventional evaporation processes have a number of shortcomings including weak adhesion which depends upon the subsurface condition of substrate, and the change of spectral characteristics and film stress in the relative humidity. Thin films coated by reactive-rf-magnetron sputtering improve these problems. In this paper, optical properties of thin films deposited by reactive-rf-magnetron sputtering are presented.
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Kunio Yoshida, Tomosumi Kamimura, Kanyoshi Ochi, Schukichi Kaku, Hidetsugu Yoshida, Hisanori Fujita, F. Tani, M. Sunagawa, Takayuki Okamoto, "Optical properties of thin films deposited by reactive-Rf-magnetron sputtering", Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); doi: 10.1117/12.274285; https://doi.org/10.1117/12.274285
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