10 April 1997 Optimization of the enhanced evanescent wave for near-field microscopy
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Proceedings Volume 2984, Three-Dimensional Microscopy: Image Acquisition and Processing IV; (1997) https://doi.org/10.1117/12.271276
Event: BiOS '97, Part of Photonics West, 1997, San Jose, CA, United States
Abstract
Near-field microscopy usually uses an evanescent wave as an illumination source on a sample. An enhanced evanescent wave can be obtained at the surface of a multilayer thin-film coating system due to the optical tunneling effect. It can improve the illumination power by several orders of magnitude in near-field microscopy. The enhancement of an evanescent wave is related to the thickness and refractive indices of the thin film layers as well as the incident angle and wavelength of the illumination source. In this paper, optimization of these parameters is studied in detail under resonance conditions, and some experimental results also are presented.
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Pu Chun Ke, Jakub Szajman, Xiasong Gan, Min Gu, "Optimization of the enhanced evanescent wave for near-field microscopy", Proc. SPIE 2984, Three-Dimensional Microscopy: Image Acquisition and Processing IV, (10 April 1997); doi: 10.1117/12.271276; https://doi.org/10.1117/12.271276
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