Excimer-laser-irradiated phase masks for grating formation

Robert J. Farley; Peter E. Dyer; Roswitha Giedl

doi:10.1117/12.270093

31 March 1997 Excimer-laser-irradiated phase masks for grating formation

Robert J. Farley, Peter E. Dyer, Roswitha Giedl

Proceedings Volume 2992, Excimer Lasers, Optics, and Applications; (1997) https://doi.org/10.1117/12.270093
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

The excimer laser provides the necessary optical resolution and sufficiently high fluence to permit rapid micro- structure patterning of polymers and glasses by ablation. Micro-scale gratings and structures formed in this way have potential applications in the fields of opto-electronic devices, display technologies and environmental sensors. Conventional broad-band excimer lasers of poor spatial and temporal coherence can be used to write sub-micron gratings with an appropriate silica phase mask in proximity mode. This simple technique has been used to fabricate fiber Bragg gratings and relief gratings on polymers. The proximity of the mask and target increases the likelihood of damage to the mask during ablation. An alternative approach using Talbot re-imaging is attractive as the mask can be remote from the samples and undesirable orders are rejected. We describe the design of a Talbot interferometer in which the zero and first order beams from a grating are recombined and experiments using this with 193 nm ArF laser illumination to form submicron gratings on polymers and in fibers.

Citation Download Citation

Robert J. Farley, Peter E. Dyer, and Roswitha Giedl "Excimer-laser-irradiated phase masks for grating formation", Proc. SPIE 2992, Excimer Lasers, Optics, and Applications, (31 March 1997); https://doi.org/10.1117/12.270093

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