31 March 1997 Improved off-axis pulsed laser deposition method
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A reduction is achieved in the number of droplets and/or large particles scattered on the surface of grown film deposited by the pulsed laser deposition method. An aperture plate is placed in front of the ablation target in order to block the scattering of droplets toward the substrate. The angle dependence of the number of scattering droplets is investigated, and the optimum aperture size and substrate position are determined. Using an aperture with 5 mm- diameter hole and placing the substrate in an off-axis position result in a significant reduction of the number of droplets. The aperture is found to prevent the scattering of droplets without substantially diminishing the deposition rate of the film.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Narumi Inoue, Narumi Inoue, Tatsuya Ozaki, Tatsuya Ozaki, Toshiaki Monnaka, Toshiaki Monnaka, Shigeru Kashiwabara, Shigeru Kashiwabara, Ryozo Fujimoto, Ryozo Fujimoto, } "Improved off-axis pulsed laser deposition method", Proc. SPIE 2992, Excimer Lasers, Optics, and Applications, (31 March 1997); doi: 10.1117/12.270083; https://doi.org/10.1117/12.270083

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