Translator Disclaimer
1 May 1997 Nanometer-scale lithography with chromium and helium atoms
Author Affiliations +
Abstract
We describe two experiments that use neutral atomic beam techniques to write nanostructures. In the chromium experiment we have used neutral chromium atoms to write periodic nanometerscale structures in a direct way. In a second experiment we have used a self-assembling monolayer as a resist for metastable helium atoms.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas Schulze, Ulrich Drodofsky, B. Brezger, J. Stuhler, S. Nowak, Tilman Pfau, and Juergen Mlynek "Nanometer-scale lithography with chromium and helium atoms", Proc. SPIE 2995, Atom Optics, (1 May 1997); https://doi.org/10.1117/12.273774
PROCEEDINGS
10 PAGES


SHARE
Advertisement
Advertisement
Back to Top