23 January 1997 Impact of phase mask technique in guided-wave device production
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Abstract
The advent of phase mask technique has made it possible to fabricate Bragg gratings to tight tolerances in a repeatable, reliable and cost effective manner. These gratings are in turn making it possible to manufacture a wide variety of high performance guided wave devices for lightwave communication and sensor applications. This paper will review the phase mask fabrication technology and the commercially available products. the paper will then discuss a few successful applications of grating based devices currently entering the market, in particular, wavelength demultiplexing devices, gain flattening filters for EDFA and dispersion compensators, all of which are critical elements in high data rate lightwave systems.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Salim K. Juma, Peter Kung, Chad Clark, "Impact of phase mask technique in guided-wave device production", Proc. SPIE 2997, Integrated Optics Devices: Potential for Commercialization, (23 January 1997); doi: 10.1117/12.264158; https://doi.org/10.1117/12.264158
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