23 January 1997 Recent development on silica waveguide technology for integrated optics
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Proceedings Volume 2997, Integrated Optics Devices: Potential for Commercialization; (1997); doi: 10.1117/12.264156
Event: Photonics West '97, 1997, San Jose, CA, United States
Abstract
Silica waveguide technologies have been developed based on a combination of the flame hydrolysis deposition and reactive ion etching, which have the advantage of structure controllability and reproducibility of integrated circuits. The bonding technology using UV adhesive and the mold packaging technology have been developed. Silica waveguide integrated devices such as 1 by N, 2 by N and N by N, polarization maintaining splitters, wavelength division multi/demultiplexers, frequency division multi/demultiplexers, dense WDMs, and optical switching devices can be commercially produced with these technologies.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Soichi Kobayashi, "Recent development on silica waveguide technology for integrated optics", Proc. SPIE 2997, Integrated Optics Devices: Potential for Commercialization, (23 January 1997); doi: 10.1117/12.264156; https://doi.org/10.1117/12.264156
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KEYWORDS
Waveguides

Silica

Wavelength division multiplexing

Fused deposition modeling

Polarization

Interferometers

Silicon

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