23 January 1997 Strong Bragg gratings in nonsensitized low-loss planar waveguides as building blocks for WDM network components
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Abstract
The performance of WDM networks is highly dependent on the wavelength selective components within the network. When using Bragg gratings as wavelength selective elements they have to fulfill a number of criteria such as low loss, high reflectivity, nearly square filter function and high background rejection. Highly photosensitive germanium doped silica-on-silicon planar waveguides have been produced by plasma enhanced chemical vapor deposition (PECVD). Total insertion losses (including fiber to waveguide coupling losses) down to 1 dB for a 5.1 cm long waveguide have been measured at 1541 nm. A germanium content of 8.6 mol% in the core combined with the PECVD process insures high photosensitivity towards 193 nm. Twenty mm long Bragg gratings have been induced by illuminating the waveguides with 193 nm light through a phase mask. The induced gratings show up to 99.98 percent reflectivity and a background rejection better than 22 dB at plus or minus 1 nm from the Bragg wavelength. No hydrogen loading or any other kind of sensitization was necessary to produce these gratings. The spectral flatness (3 dB reflection bandwidth: 0.55 nm and 1 dB reflection bandwidth: 0.47 nm) around the Bragg wavelength and the high background rejection make these gratings well suited building blocks for multi-wavelength network components.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joerg Huebner, Joerg Huebner, Jean-Marc Jouanns, Jean-Marc Jouanns, Jens Engholm Pedersen, Jens Engholm Pedersen, Rasmus Kromann, Rasmus Kromann, Thomas Feuchter, Thomas Feuchter, Martin Kristensen, Martin Kristensen, "Strong Bragg gratings in nonsensitized low-loss planar waveguides as building blocks for WDM network components", Proc. SPIE 2998, Photosensitive Optical Materials and Devices, (23 January 1997); doi: 10.1117/12.264171; https://doi.org/10.1117/12.264171
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