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25 April 1997 Photolithography of integrated optical devices in porous glasses
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We are developing a completely new technology for the low cost fabrication of integrated optic devices (IODs) in silica glasses. This technology is based on direct photolithographic writing of IODs onto photoactive sol-gel glasses. Waveguide patterns are formed by straightforward photolithographic techniques. Depending on the choice of photosensitive glass, these waveguide patterns can be passive (simply having a higher index of refraction than the surrounding `host' glass) or active (with optical properties that can be influenced by the application of electric or magnetic fields). The simplicity of this process makes it very promising for the fabrication of commercially viable integrated optic devices.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Edgar A. Mendoza, Daniel P. Robinson, and Robert A. Lieberman "Photolithography of integrated optical devices in porous glasses", Proc. SPIE 3007, Silicon-Based Monolithic and Hybrid Optoelectronic Devices, (25 April 1997);

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