11 April 1997 Dielectric microfilter arrays for multispectral measuring devices
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Abstract
For specified color measuring devices miniaturized dielectric filter arrays have been designed and developed. The manufacturing procedure is based on the combination of coating- and micropatterning processes including the employment of etchstop layers. The spectral properties of a basic filter, fabricated as an unpatterned filter blank, have been modified within small areas by reactive ion etching a defined number edge by edge within a period of 25 micrometers . In this paper design and development of two-color microfilter arrays are described and problems are depicted, arising with the production of multicolor dielectric microfilters. An alternative manufacturing procedure is discussed, making it possible to arrange more than two different interference filters edge by edge.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marcus Frank, Marcus Frank, Uwe B. Schallenberg, Uwe B. Schallenberg, Norbert Kaiser, Norbert Kaiser, Wolfgang Buss, Wolfgang Buss, } "Dielectric microfilter arrays for multispectral measuring devices", Proc. SPIE 3008, Miniaturized Systems with Micro-Optics and Micromechanics II, (11 April 1997); doi: 10.1117/12.271423; https://doi.org/10.1117/12.271423
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