Method for making balanced multiple exposures in single-layer holograms

Gaylord E. Moss

doi:10.1117/12.271352

10 April 1997 Method for making balanced multiple exposures in single-layer holograms

Gaylord E. Moss

Proceedings Volume 3011, Practical Holography XI and Holographic Materials III; (1997) https://doi.org/10.1117/12.271352
Event: Electronic Imaging '97, 1997, San Jose, CA, United States

Abstract

Holographic optical elements with several optical functions recorded in a single layer have advantages in many applications. They have been difficult to fabricate because when they are recorded simultaneously in a single layer, spurious holograms are formed from the crosstalk between the recording beams. For some materials, sequential recording is a solution, but the mobile nature of photopolymer materials during recording prohibits the usual sequential techniques. The result has been that the crosstalk problem has required such holograms to be made from multiple layers causing both increased cost and reduced performance. This paper describes a method of recording such multiple elements in a single layer that completely eliminates such crosstalk holograms. The beams that form each hologram function included in the element are shuttered on in pairs for short intervals. Only the recording beams that form a desired hologram are present at any given time. No crosstalk occurs, since no unwanted beams are ever present. All holograms grow at the same rate as they each in turn receive short exposures. The round of exposures is repeated many times until they are all fully exposed. By keeping each round's exposures short, all holograms form essentially simultaneously, ensuring that they all see nearly the same recording material characteristics at the same stage of their development. This equalizes the recording of each element, even though the characteristics of the recording material change drastically and nonlinearly during the recording.

Citation Download Citation

Gaylord E. Moss "Method for making balanced multiple exposures in single-layer holograms", Proc. SPIE 3011, Practical Holography XI and Holographic Materials III, (10 April 1997); https://doi.org/10.1117/12.271352

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available