Recordable depth of view and allowable farthest far-field distance of in-line far-field holography for micro-object analysis

Tianshu Lai; Weizhu Lin

doi:10.1117/12.271349

10 April 1997 Recordable depth of view and allowable farthest far-field distance of in-line far-field holography for micro-object analysis

Tianshu Lai, Weizhu Lin

Author Affiliations +

Proceedings Volume 3011, Practical Holography XI and Holographic Materials III; (1997) https://doi.org/10.1117/12.271349
Event: Electronic Imaging '97, 1997, San Jose, CA, United States

Abstract

A general recording model of in-line far-field holography is first proposed, which includes three illumination modes: divergent, convergent and collimated beam illuminations. The general irradiance distribution on a hologram is then derived from the general recording model. Based on the general irradiance distribution of in-line far-field holography, the analytical solutions of recordable depth of view (RDV) and allowable farthest far-field distance (AFFD) of in-line far-field holography have been given for different illumination modes. The analytical solutions of RDV and AFFD show that AFFD can be not limited if micro- objects are positioned in one special space and illuminated by convergent beams, but RDV isn't improved. When micro- objects are placed in another special space and illuminated by divergent beam, the RDV and AFFD can be improved simultaneously, but recording object space is split into two sub-spaces. These results are very important for the design of holographic recording system.

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Tianshu Lai and Weizhu Lin "Recordable depth of view and allowable farthest far-field distance of in-line far-field holography for micro-object analysis", Proc. SPIE 3011, Practical Holography XI and Holographic Materials III, (10 April 1997); https://doi.org/10.1117/12.271349

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KEYWORDS

Zirconium

Holography

Collimation

Holograms

Optical design

Beam splitters

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