10 April 1997 Pure aluminum process solution for advanced LCDs
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Large size high-resolution liquid crystal displays put severe restriction on metal selection for gate lines where very low resistivity is required. Pure aluminum (Al) could be used of hillocking issues could be resolved. In this paper we demonstrated an Al deposition process on glass substrates with ultra low hillock density after photoresist and dielectric processing. Effects of process parameters such as substrate temperature, substrate roughness, base pressure and underlayer thickness on morphology and texture of aluminum are discussed.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rajiv G. Pethe, Milind Bedekar, Richard E. Demaray, Chandra V. Deshpandey, Henry Shao, "Pure aluminum process solution for advanced LCDs", Proc. SPIE 3014, Active Matrix Liquid Crystal Displays Technology and Applications, (10 April 1997); doi: 10.1117/12.270287; https://doi.org/10.1117/12.270287

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