3 April 1997 Real-time machine vision for semiconductor manufacturing
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Proceedings Volume 3028, Real-Time Imaging II; (1997); doi: 10.1117/12.270350
Event: Electronic Imaging '97, 1997, San Jose, CA, United States
Abstract
Real-time vision has many applications in the area of semiconductor manufacturing. Typical processes use machine vision for alignment, inspection, measurement, process control, and quality control. This paper describes one application where machine vision is used in conjunction with a diffraction based optical technique to measure linewidth for use in critical dimension control.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Edward T. Polkowski, "Real-time machine vision for semiconductor manufacturing", Proc. SPIE 3028, Real-Time Imaging II, (3 April 1997); doi: 10.1117/12.270350; http://dx.doi.org/10.1117/12.270350
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KEYWORDS
Diffraction

Semiconducting wafers

Diffraction gratings

Machine vision

Semiconductor manufacturing

Critical dimension metrology

Image processing

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