Anvik Corporation has developed a class of novel projection systems that provide both high-throughput resist patterning and dielectric photoetching for production of a variety of electronic modules including flat panel displays, multichip modules, microelectromechanical systems, and printed circuit boards. This new technology eliminates the limitations of current lithography tools, including contact and proximity tools, conventional projection systems, steppers and scanners, and direct-write machines. Further, the Anvik system is highly modular, thereby providing equipment upgradability as well as choice of user-specified system configurations. These results are achieved with a novel seamless scanning concept and stage system configurations that provide both high optical and scanning efficiencies, and enable incorporation of a high-speed automatic part loader and an automatic alignment system. We describe the new technology and present results which demonstrate 3 micron resolution in commercial photoresists.