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Impact of the Coulomb interaction effect on delineating densely repeated 0.1-μm patterns using electron-beam block exposure
Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry
Method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist: KRS
Fabrication of high-performance MSM photodetectors on SOI with nanometer-scale scattering buried backside reflectors
Measurement of mid-spatial-frequency scatter in extreme ultraviolet lithography systems using direct aerial image measurements
Fabrication process of superconducting integrated circuits with submicron Nb/AlOx/Nb junctions using electron-beam direct writing technique
Optical lithography--thirty years and three orders of magnitude: the evolution of optical lithography tools