Highly accurate alignment technology for electron-beam lithography in mix-and-match with optical stepper

Yoshinori Nakayama; Yasuko Gotoh; Norio Saitou; Hajime Hayakawa; Minoru Sasaki

doi:10.1117/12.275784

7 July 1997 Highly accurate alignment technology for electron-beam lithography in mix-and-match with optical stepper

Yoshinori Nakayama, Yasuko Gotoh, Norio Saitou, Hajime Hayakawa, Minoru Sasaki

Proceedings Volume 3048, Emerging Lithographic Technologies; (1997) https://doi.org/10.1117/12.275784
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

A novel alignment technology for electron-beam lithography is proposed for hybrid use with i-line steppers. This alignment technology was developed based on the evaluation of alignment characteristics and on the investigation of alignment errors in electron-beam lithography systems used in the mix-and-match process. In this alignment method, global alignment using representative chips on a wafer effectively achieves accurate overlay and high throughput. Overlay measurements showed that the deviation in the alignment error is smaller than 70 nm within 3 sigma.

Citation Download Citation

Yoshinori Nakayama, Yasuko Gotoh, Norio Saitou, Hajime Hayakawa, and Minoru Sasaki "Highly accurate alignment technology for electron-beam lithography in mix-and-match with optical stepper", Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); https://doi.org/10.1117/12.275784

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available