7 July 1997 Interferometric lithography exposure tool for 180-nm structures
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Abstract
Keywords: interferometric lithography, 300-mm wafer, 1 80-nm CD
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Saleem H. Zaidi, Steven R. J. Brueck, Franklin M. Schellenberg, R. Scott Mackay, K. Uekert, and Jeffrey J. Persoff "Interferometric lithography exposure tool for 180-nm structures", Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); doi: 10.1117/12.275785; https://doi.org/10.1117/12.275785
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