7 July 1997 Three-dimensional electron-beam lithography simulation
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Abstract
A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography. Monte Carlo simulations are combined with a beam shape to generate a single 'pixel' energy distribution. This pixel is then used to write a pattern by controlling the dose of every pixel on an address grid. The resulting dose pattern is used to expose and develop a resist to form a three-dimensional resist pattern.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris A. Mack, Chris A. Mack, } "Three-dimensional electron-beam lithography simulation", Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); doi: 10.1117/12.275807; https://doi.org/10.1117/12.275807
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