7 July 1997 Laser-specific photochemistry and lithography of DNQ-4-sulfonic-acid-ester-based photoresists
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Abstract
The photolysis of DNQ-4-sulfonic acid esters yields 3- indenecarboxylic acid-1-sulfonic ester (3-ICA-1-SE). 3-ICA-1- SE reacts to the corresponding sulfonic acid. The rate of the ester cleavage is fast at exposure and slow in the dark. The deep UV lamp or laser exposure using low intensity is most effective for acid generation, pH change and network formation (image reversal).
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Juergen Bendig, Juergen Bendig, Siegrun Helm, Siegrun Helm, A. Uhl, A. Uhl, Lothar Bauch, Lothar Bauch, } "Laser-specific photochemistry and lithography of DNQ-4-sulfonic-acid-ester-based photoresists", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275853; https://doi.org/10.1117/12.275853
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