7 July 1997 Measurement of trace acid levels in diazonaphthoquinone photoactive compounds (PACs)
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Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997); doi: 10.1117/12.275855
Event: Microlithography '97, 1997, Santa Clara, CA, United States
Abstract
With the continuing drive to control and improve resist performance, the need to monitor and control all aspects of the resist has become more important. The presence of acids in the resist can have a significant impact on the performance. Monitoring acid levels in diazonaphthoquinone PACs is an area that has not had much attention to date. A procedure has been developed to measure acid levels in these compounds. The procedure uses Congo red dye as an acid indicator in aqueous THF and monitors changes spectrophotometrically. The method is capable of measuring acidity of resist components in the 10 to 100 ppm range. This procedure has been applied to the forced aging of dry diazonaphthoquinone PACs. The results show that the 2,1,5 isomer decomposes faster than the 2,1,4, isomer. The method is sufficiently general that it can be used to monitor acid level in other resist components or in resist solutions (see also accompanying paper #3049-50).
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph E. Oberlander, Stan F. Wanat, Eleazar Gonzalez, Douglas S. McKenzie, "Measurement of trace acid levels in diazonaphthoquinone photoactive compounds (PACs)", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275855; https://doi.org/10.1117/12.275855
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KEYWORDS
Absorbance

Picture Archiving and Communication System

Methane

Error analysis

Ultraviolet radiation

Calibration

Spectrophotometry

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