Novel polymeric dyes for bottom antireflective coatings

Shuji Ding; Ping-Hung Lu; Ralph R. Dammel; Jianhui Shan; Salem Mehtsun; T. T. Hannigan; D. E. Eberly; Dinesh N. Khanna; Hatsuyuki Tanaka

doi:10.1117/12.275879

7 July 1997 Novel polymeric dyes for bottom antireflective coatings

Shuji Ding, Ping-Hung Lu, Ralph R. Dammel, Jianhui Shan, Salem Mehtsun, T. T. Hannigan, D. E. Eberly, Dinesh N. Khanna, Hatsuyuki Tanaka

Author Affiliations +

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275879
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

In lithographic processing, implementation of a bottom antireflective coating can reduce or eliminate reflective notching and swing effects, thereby improving linewidth (CD) control. We have recently synthesized a series of novel polymeric dyes and evaluated them as bottom antireflective coatings for i-line lithographic applications. This work has led to the development of the BARLi^TM II commercial bottom coat material. The BARLi^TM II films show high absorbance at 365 nm and excellent coating uniformity. They are tailor- made to yield the optimum values for refractive indices (n and k) for i-line which ensures minimum reflectivity and maximum swing reduction for photoresist layers. BARLi^TM II materials are formulated in photoresist compatible solvents to simplify the EBR process and to be environmentally and user friendly. Data presented in this paper also include BARLi^TM II thermal stability, resist intermixing test, etch selectivity, swing reduction, lithographic performance, and step coverage profiles.

Citation Download Citation

Shuji Ding, Ping-Hung Lu, Ralph R. Dammel, Jianhui Shan, Salem Mehtsun, T. T. Hannigan, D. E. Eberly, Dinesh N. Khanna, and Hatsuyuki Tanaka "Novel polymeric dyes for bottom antireflective coatings", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275879

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