Novel process of isolating novolac resin fractions

M. Dalil Rahman; Ping-Hung Lu; Michelle M. Cook

doi:10.1117/12.275863

7 July 1997 Novel process of isolating novolac resin fractions

M. Dalil Rahman, Ping-Hung Lu, Michelle M. Cook

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275863
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Typical phenol/formaldehyde resin syntheses generate a broad distribution of molecular weight fragments with a wide polydispersity. A process was developed to isolate novolak resin fractions of narrow polydispersity from phenol- formaldehyde condensation products in ethyl lactate without any high temperature distillation. The characterization and the performance of these fractions in i-line photoresist composition are discussed.

Citation Download Citation

M. Dalil Rahman, Ping-Hung Lu, and Michelle M. Cook "Novel process of isolating novolac resin fractions", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275863

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