7 July 1997 Overview of photoacid generator design for acetal resist systems
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Abstract
An overview is given of how the design of photoacid generators (PAGs) is critical to tuning both the lithographic and thermal properties of chemically amplified resist systems. The importance of PAG chemistry is illustrated with an ARCH resist system that contains acetal protecting groups removable with low activation energies. We detail the effect of PAG on the resist's resolution, depth of focus and thermal decomposition temperature.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Francis M. Houlihan, Francis M. Houlihan, Omkaram Nalamasu, Omkaram Nalamasu, Elsa Reichmanis, Elsa Reichmanis, Allen G. Timko, Allen G. Timko, Ulrike Varlemann, Ulrike Varlemann, Thomas I. Wallow, Thomas I. Wallow, N. R. Bantu, N. R. Bantu, John J. Biafore, John J. Biafore, Thomas R. Sarubbi, Thomas R. Sarubbi, Pasquale A. Falcigno, Pasquale A. Falcigno, H. J. Kirner, H. J. Kirner, Norbert Muenzel, Norbert Muenzel, Klaus Petschel, Klaus Petschel, Hans-Thomas Schacht, Hans-Thomas Schacht, Reinhard Schulz, Reinhard Schulz, } "Overview of photoacid generator design for acetal resist systems", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275848; https://doi.org/10.1117/12.275848
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