7 July 1997 Photoresist development modeling based on continuity equations
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Abstract
In this paper, we propose a model to simulate photoresist development based on continuity equations. In the resist dissolution process, to consider different components (developer, resist, reaction by-product, etc.), each component's local concentration is described by the continuity equation. The resist development process is viewed as the diffusion-reaction process of all components involved in the dissolution process. A simulation program has been written based on the above concept. The simulation for different previous existing models are discussed.
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Yueqi Zhu, Yueqi Zhu, Luigi Capodieci, Luigi Capodieci, Franco Cerrina, Franco Cerrina, } "Photoresist development modeling based on continuity equations", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275819; https://doi.org/10.1117/12.275819
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