7 July 1997 Photoresist materials: a historical perspective
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Abstract
This paper provides a short history of the development of resist materials. We trace the development of resists from the very beginnings of photography in the early 1800s to today's efforts to develop 193 nm resist materials.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. Grant Willson, C. Grant Willson, Ralph R. Dammel, Ralph R. Dammel, Arnost Reiser, Arnost Reiser, } "Photoresist materials: a historical perspective", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); doi: 10.1117/12.275826; https://doi.org/10.1117/12.275826
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