7 July 1997 Effect of reticle bias on isofocal process performance at sub-half-micron resolution
Author Affiliations +
Abstract
This paper investigates, by computer simulation, the effect of reticle bias on the isofocal behavior displayed by a range of feature types down to 0.4 micron resolution. All simulations are in the developed resist image and exploit resist and development parameters of a contemporary i-line positive resist. Results show that, with the exception of isolated lines, the application of reticle bias is ineffective in achieving a corresponding shift in the isofocal dimension.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Brian Martin, Graham G. Arthur, "Effect of reticle bias on isofocal process performance at sub-half-micron resolution", Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); doi: 10.1117/12.275909; https://doi.org/10.1117/12.275909
PROCEEDINGS
11 PAGES


SHARE
RELATED CONTENT


Back to Top