7 July 1997 Highly accurate CD measurement with a micro standard
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Accurate measurement with CD-SEMs requires the use of a calibrated standard. A new standard, micro-scale was developed using laser interferometer lithography and anisotropic chemical etching on Si-material and was reported previously. In this paper, we report on a method to control measurement accuracy of CD-SEMs using the micro-scale. We have studied various factors for measurement errors and have estimated the 95 percent confidence level. We have carried out 3-pitch measurement of the micro-scale in a fully automated mode and estimated the 95 percent confidence level. Then, we compared two 95 percent confidence levels and concluded that the estimation expected from the measurement errors was reasonable.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Katsuhiro Sasada, Katsuhiro Sasada, Nobuyoshi Hashimoto, Nobuyoshi Hashimoto, Hiroyoshi Mori, Hiroyoshi Mori, Tadashi Ohtaka, Tadashi Ohtaka, } "Highly accurate CD measurement with a micro standard", Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); doi: 10.1117/12.275945; https://doi.org/10.1117/12.275945

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