Method to characterize overlay tool misalignments and distortions

Richard M. Silver; James E. Potzick; Fredric Scire; Christopher J. Evans; M. McGlauflin; Edward Kornegay; Robert D. Larrabee

doi:10.1117/12.275965

7 July 1997 Method to characterize overlay tool misalignments and distortions

Richard M. Silver, James E. Potzick, Fredric Scire, Christopher J. Evans, M. McGlauflin, Edward Kornegay, Robert D. Larrabee

Author Affiliations +

Proceedings Volume 3050, Metrology, Inspection, and Process Control for Microlithography XI; (1997) https://doi.org/10.1117/12.275965
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

A new optical alignment artifact under development at NIST is described. This artifact, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. We outline the design criteria and diamond turning lathe techniques used for manufacturing this structure. The alignment methods using this artifact allow the separation of error components associated with the optical system or the mechanical positioning systems as encountered when performing measurements in different focal planes.Although some difficulties have been encountered when performing measurements in different focal planes. Although some difficulties have been encountered in the actual diamond turning process,the data presented show some improvements with the more recent prototypes which indicate that this method of fabrication will be useful. Photometer scan data and CCD image acquisition hardware show a significant optical response at the step edges from these structures. Initial analysis of the optical response of these edges shows sensitivity to the material used and the details of the manufacturing processes.

Citation Download Citation

Richard M. Silver, James E. Potzick, Fredric Scire, Christopher J. Evans, M. McGlauflin, Edward Kornegay, and Robert D. Larrabee "Method to characterize overlay tool misalignments and distortions", Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); https://doi.org/10.1117/12.275965

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available