7 July 1997 Photoresist materials: a historical perspective
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Abstract
This paper provides a short history of the development of resist materials. We trace the development of resists form the very beginnings of photography in the early 1800's to today's efforts to develop 193nm resist materials.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. Grant Willson, C. Grant Willson, Ralph R. Dammel, Ralph R. Dammel, Arnost Reiser, Arnost Reiser, } "Photoresist materials: a historical perspective", Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); doi: 10.1117/12.275921; https://doi.org/10.1117/12.275921
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