Paper
7 July 1997 Characterization of autofocus uniformity and precision on ASML steppers using the phase-shift focus monitor reticle
Richard D. Edwards, Paul W. Ackmann, Christine Fischer, Mark Desrocher, Mark Puzerewski
Author Affiliations +
Abstract
This paper details a method that was used to evaluate and characterize autofocus uniformity and repeatability issues which were exhibited on ASML 5500/100 Stepper systems at Advanced Micro Devices in Austin, Texas. Equally significant is the process by which these issues were resolved through a cooperative effort with ASM Lithography, which is also discussed. Data shown in this paper was collected using the Phase Shift Focus Monitor Reticle, produced by Benchmark Technologies. The coactive relationship between ASML and AMD was integral in identifying the cause of this long-standing condition, as well as providing and implementing the required solution.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Richard D. Edwards, Paul W. Ackmann, Christine Fischer, Mark Desrocher, and Mark Puzerewski "Characterization of autofocus uniformity and precision on ASML steppers using the phase-shift focus monitor reticle", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.275969
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CITATIONS
Cited by 3 scholarly publications and 2 patents.
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KEYWORDS
Reticles

Lithography

Phase shifts

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