Comparison between rigorous light-scattering methods

Mark P. Davidson; Bernd H. Kleemann; Joerg Bischoff

doi:10.1117/12.276040

7 July 1997 Comparison between rigorous light-scattering methods

Mark P. Davidson, Bernd H. Kleemann, Joerg Bischoff

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276040
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

In this paper four radically different methods for solving scattering of light off of mainly lameller grating type structures are compared. The methods are: (1) the analytic waveguide method (Metrologia), (2) the integral equation system with parametrization and sampling along the profile (IESMP) developed at BIFO, (3) the integral equation method with discretization along the x-axis (PC-Grate 2), and (4) the rigorous coupled-wave analysis (RCWA). The results show that the analytic waveguide method and the integral equation method with parametrization (IESMP) agree with extremely high accuracy in all cases studied for both polarization states TE and TM. For the special case of near field slit simulation the same high agreement is found between Metrologia and a FEM method. It is also found that the agreement of RCWA and PC-Grate 2 with either of the other two methods is only fair, particularly for TM mode on gratings made of good conductors. Using an improvement, the RCWA results become significantly better and correspond with the results of IESMP and Metrologia.

Citation Download Citation

Mark P. Davidson, Bernd H. Kleemann, and Joerg Bischoff "Comparison between rigorous light-scattering methods", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276040

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