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7 July 1997 Micrascan III: performance of a third-generation catadioptric step-and-scan lithographic tool
Daniel R. Cote; Keith W. Andresen; David J. Cronin; Hilary G. Harrold; Marc D. Himel; J. Kane; Joe Lyons; Louis Markoya; Christopher J. Mason; Diane C. McCafferty; Matthew E. McCarthy; Geoffrey O'Connor; Harry Sewell; David M. Williamson
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Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276001
Event: Microlithography '97, 1997, Santa Clara, CA, United States
Abstract
The evolution of microlithography to 0.25 micrometers and below has driven the need for performance enhancements in several critical areas. Among these are imaging, illumination, and overlay. This paper briefly reviews MicrascanTM III system concepts. The main body of the paper presents system level performance and discusses the key subsystems which enable 0.25 micron imaging and 55 nm overlay. Autocal, MicrascanTM III's image, reticle and wafer position reference subsystem is discussed with respect to functionality and performance with a pulsed illumination source. MicrascanTM III illuminator performance, including automated off axis illumination module are presented. Performance of the magnetically levitated Monostage and its interaction with overlay and imaging is discussed. System performance with respect to resolution, image quality and overlay on product levels is presented and analyzed.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Daniel R. Cote, Keith W. Andresen, David J. Cronin, Hilary G. Harrold, Marc D. Himel, J. Kane, Joe Lyons, Louis Markoya, Christopher J. Mason, Diane C. McCafferty, Matthew E. McCarthy, Geoffrey O'Connor, Harry Sewell, and David M. Williamson "Micrascan III: performance of a third-generation catadioptric step-and-scan lithographic tool", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276001
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