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7 July 1997 New approach to data preparation and processing for high-density patterns
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A modern pattern generator needs very high data-handling capacity, partly because the number of features per mask is growing, partly because OPC and other sophisticated lithographic enhancements increase the complexity. MICRONIC makes a wide range of laser pattern generators for display, reticles and other electronics applications, and therefore needs a hardware/software datapath that is configurable over a wide range of requirements and cost levels. An extendible multiprocessor architecture offers this flexibility: possibility for multiprocessing for very high power, and at the same time ability to configure small systems for low-end applications. Preliminary benchmarks show a speed increase over previous systems by 10 to 60 times for a single processor.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anders Thuren and Torbjoern Sandstrom "New approach to data preparation and processing for high-density patterns", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997);

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