7 July 1997 Optical proximity correction in DRAM cell using a new statistical methodology
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An optical proximity correction algorithm based on statistical methodology is developed. The response surface function (RSF) for the CD in the lithographic process is extended by introducing variables for the mask pattern size. The values of process parameters and mask pattern size are concurrently optimized by using the RSF. This methodology allows design for manufacturability, considering error distributions of process parameters such as focus position and exposure dose. The algorithm is applied to a DRAM cell pattern. The result indicates the annular illumination with larger coherency than that of the conventional illumination improve the CD limited yield.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Akio Misaka, Akio Misaka, Akihiko Goda, Akihiko Goda, Koji Matsuoka, Koji Matsuoka, Hiroyuki Umimoto, Hiroyuki Umimoto, Shinji Odanaka, Shinji Odanaka, } "Optical proximity correction in DRAM cell using a new statistical methodology", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.275994; https://doi.org/10.1117/12.275994

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