7 July 1997 Performance of a step-and-scan system for DUV lithography
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Abstract
To meet the high productivity standards, set by current top- end stepper systems, the use of excimer laser sources and high scanning speeds are essential. This paper reports on a new Step & Scan system capable of exposing 26 X 33 mm fields, using a 248 nm DUV-lens with a variable Numerical Aperture of 0.40 to 0.63. The system is equipped with an advanced AERIALTM illuminator which allows the user to choose coherence and illumination modes on a job-by-job basis. The double telecentric lens is equipped with lens manipulators to allow on-site aberration control. Results are presented on dynamic image distortion, field flatness and dynamic imaging performance. Performance of the overlay accuracy and dose accuracy at high scanning speeds proves that Step & Scan technology is now developed to a level suitable for use in high volume sub 0.25 micrometers manufacturing.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gerard de Zwart, Gerard de Zwart, Martin A. van den Brink, Martin A. van den Brink, Richard A. George, Richard A. George, Danu Satriasaputra, Danu Satriasaputra, Jan Baselmans, Jan Baselmans, H. Butler, H. Butler, Jan B.P. van Schoot, Jan B.P. van Schoot, Jos de Klerk, Jos de Klerk, } "Performance of a step-and-scan system for DUV lithography", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276002; https://doi.org/10.1117/12.276002
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