Translator Disclaimer
7 July 1997 Performance of excimer lasers as light sources for 193-nm lithography
Author Affiliations +
Abstract
The performance of argon fluoride excimer lasers is an important issue in determining the practical feasibility of 193-nm exposure systems. This paper presents a summary of the experience gained at MIT Lincoln Laboratory regarding the long-term performance of 193-nm lasers, used under conditions similar to those expected in production-type lithographic systems.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan H. C. Sedlacek, Scott P. Doran, Michael Fritze, Roderick R. Kunz, Mordechai Rothschild, Ray S. Uttaro, and Daniel A. Corliss "Performance of excimer lasers as light sources for 193-nm lithography", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276008; https://doi.org/10.1117/12.276008
PROCEEDINGS
8 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

N2 laser stereo-lithography
Proceedings of SPIE (November 05 2000)
193 nm full field step and scan prototype at MIT...
Proceedings of SPIE (May 25 1995)
Dose control for short exposures in excimer laser lithography
Proceedings of SPIE (February 28 1991)
High-resolution contact lithography by excimer lasers
Proceedings of SPIE (November 05 2000)

Back to Top