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7 July 1997 Performance of excimer lasers as light sources for 193-nm lithography
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The performance of argon fluoride excimer lasers is an important issue in determining the practical feasibility of 193-nm exposure systems. This paper presents a summary of the experience gained at MIT Lincoln Laboratory regarding the long-term performance of 193-nm lasers, used under conditions similar to those expected in production-type lithographic systems.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan H. C. Sedlacek, Scott P. Doran, Michael Fritze, Roderick R. Kunz, Mordechai Rothschild, Ray S. Uttaro, and Daniel A. Corliss "Performance of excimer lasers as light sources for 193-nm lithography", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); doi: 10.1117/12.276008;


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